Vacuum Coating System
Vacuum Coating System
01. Roll to Roll Coating System
The Roll to Roll coating system enables continuous thin film coating of flexible materials and is widely used in the production of FCCL, FPCB, various functional films, OLEDs which are next-generation display and Flexible solar cells Equipment.
– Film Width : up to 1,100mm available
02. Batch Type Coating System
Ziwoo Technology’s batch type coating system is a commercial cleaning coating equipment used for large quantity-coating for plastics, lens, EMI filters, optical filters, reflectors, and accessories, etc.
Lon Plating System (Supercoaty ZIP Series)
| Description | Standard Model | ZIP – 08 | ZIP – 10 | ZIP – 12 | ZIP – 15 |
| Chamber Size(mm) | dia.800 x H850 | dia.1000 x H1100 | dia.1200 x H1300 | dia.1500 x H1600 | |
| Jig Assembly | Rotationg Jig | ||||
| Substrate Bias Source | DC or RF | ||||
| Substrate Heating | Micro Sheath Heater, Max 350 ℃ | ||||
| Vacuum Pump | Oil Diffusion | 8500ℓ/min | 8500ℓ/min x 2ea | 13000ℓ/min x 2ea | 15000ℓ/min x 2ea |
| Rotary | 3000ℓ/min | 3000ℓ/min | 4500ℓ/min | 7000ℓ/min | |
| Mechanical Booster | 250㎥/hr | 600㎥/hr | 1000㎥/hr | 1300㎥/hr | |
| Power | DC (Sputtering) | 20 ~ 30KW | |||
| RF (Etching, Bias) | 60w ~ 2KW | ||||
| RF | Option | ||||
| Ultimate Vacuum | ~ x10-6 Torr | ||||
03. Suttering System
The sputter-based thin film coating equipment is widely used commercially for wafer coating, ITO coating for LCD glass, and thin-film coating on various films. It is also used in research laboratories and universities for various R&D purposes.
– A customized specification is available –
Sputtering System (Supersputty ZCS Standard Series)
| Description | Standard Model | ZCS – 4 | ZCS – 6 | ZCS – 8 |
| Cathode | Type | Magnetron or Diode | ||
| Target Size(mm) | dia. 101.6 | dia. 152.4 | dia. 203.2 | |
| Number | Max. 3ea | Max. 3ea | Max. 3ea | |
| Substrate | Size(mm) | dia. 350 | dia. 450 | dia. 550 |
| Rotation | 1~20 rpm(Option;Magnetic Seal) | |||
| Up & Down | Stroke 0 ~ 100mm(Motor Drive) | |||
| Healting | 400 ~ 850 ℃ | |||
| Pump | Rotary & 8inch Cryogenic | Rotary & 10inch Cryogenic | Rotary & 12inch Cryogenic | |
| Power Source | RF or DC | |||
| Ultimate Pressure | ~x10-6 Torr or less | |||
| Option | Pump(Turbo Molecular/Oil Diffusion), RF Etching, Bias, APC, Number of Target, etc. |
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